193 nm Immersion Lithography-Taking the Plunge
نویسندگان
چکیده
منابع مشابه
Study of Air Bubble Induced Light Scattering Effect On Image Quality in 193 nm Immersion Lithography
As an emerging technique, immersion lithography offers the capability of reducing critical dimensions by increasing numerical aperture (NA) due to the higher refractive indices of immersion liquids than that of air. Among the candidates for immersion liquids, water appears to be an excellent choice due to its high transparency at a wavelength of 193 nm, as well as its immediate availability and...
متن کاملTiSi-nitride attenuating phase-shift photomask for 193 nm lithography
G. A. M. Reynolds, R. H. French, P. F. Carcia, C. C. Torardi, G. Hughes, D. J. Jones, M. F. Lemon, M. Reilly, L. Wilson, C. R. Miao “TiSi-nitride attenuating phase-shift photomask for 193 nm lithography”, 18th Annual BACUS Symposium on Photomask Technology and Management, SPIE Vol. 3546, Edited by B. J. Grenon, F. E. Abboud, 514-23, (1998). TiSi-nitride attenuating phase-shift photomask for 193...
متن کاملAlternatives to Chemical Amplification for 193 nm Lithography
Research has been conducted to develop alternatives to chemically amplified 193 nm photoresist materials that will be able to achieve the requirements associated with sub-32 nm device technology. New as well as older photoresist design concepts for non-chemically amplified 193 nm photoresists that have the potential to enable improvements in line edge roughness while maintaining adequate sensit...
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During the 1980s, the profile of recreational water quality at Sydney’s beaches caused concern among Sydneysiders. Monitoring of recreational water quality indicated that most Sydney beaches had poor water quality, and this condition was attributed to the disposal of partiallytreated sewage at cliff-face discharges. An epidemiological study conducted in 1989–1990 attempted to determine the prev...
متن کاملTechnology backgrounder: Immersion Lithography
The growth of the semiconductor industry is driven by Moore’s law: “The complexity for minimum component cost has increased at a rate of roughly a factor of two per year” [1]. Notice that Moore observed that not only was the number of components doubling yearly, but was doing so at minimum cost. One of the main factors driving the improvements in complexity and cost of ICs, is improvements in p...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2004
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.17.587